Materials and Processes for Micro & Nano Technologies

Characterizations and processing

Dual beam microscopy set up

The FEI QuantaTM 3D FEG DualBeamTM is a facility of the Nanofacility Piemonte laboratory (available under project proposal), for the micro-nano processing and characterization of materials.
It is composed by

• a conventional Field Emission Scanning Electron Microscope (FESEM) column
• a ionic column (Ga ions) for the Focused Ion Beam (FIB) technique

The system could work in

• high vacuum mode
• low vacuum mode
• environmental mode

The system is also equipped with

• a NanoPattern Generator NPGS 9.0 (J.C. Nabity Systems) for the electron and ion nanolithography
• four nanoprobes Kleindiek nanoteknik for the in situ manipulation and electrical characterization
• a STEM detector

Performances

• Electron Beam Resolution:
  - 1.2 nm at 30kV (high SE)
  - 1.5 nm at 30kV (low SE)
  
• Accelerating Voltage: 200V - 30kV
• Probe Current: up to 200nA
• Magnification: 30 x - 1280 kx in "quad" mode
• Ion Beam Resolution: 7 nm at 30 kV

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