Materials and Processes for Micro & Nano Technologies

Characterizations and Processing

SEM and Nanolithography System - Jeol JSM 6400

PERFORMANCE

• Secondary electron image resolution (at 35kV)
• at 8mm working distance: 3.5nm
• at 39mm working distance: 10.0nm
• Magnification zoom mode: 10x (at 39mm working distance) to 300000x
• Probe current: 10-12 to 10-5 A

ELECTRON OPTICAL SYSTEM

• Electron gun
• Acelerating voltage: 0.2 to 40kV
• Cathode: precentered tungsten filament
• Anode: two vertical position selectable
• Focusable working distance: 3 to 53 mm
• Automatic focus: built-in
• Stigmator: electromagnetic, with X and Y controls; automatic correction is also possible

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