Materials and Processes for Micro & Nano Technologies
Growth Systems
Thermal Chemical Vapor Deposition (CVD)
The thermal-Chemical Vapor Deposition, from solid precursors (camphor and ferrocene), allows an efficient and economic deposition of a wide range of carbon-based materials such as carbon nanotubes (CNTs), nanographite and carbon fibers (CF).
Available gas linesWorking pressure
- Ar, N2, air
Heating unit
- from 10-3 Torr up to ambient pressure
In our laboratory we have the possibility to use two different deposition system:
- maximum deposition temperature 1100 °C
- An horizontal furnace with about 30 cm2 of deposition zone on silicon substrates. The heating system is formed by three separate resistance wire.
- The new system consists of a chamber heated by HF system. It contains a rotation system where a 4” Si wafer is supported. There is the possibility to inject reagents in horizontal or vertical (by a shower) way.
Both systems support an Injection System for reagents: two reagents are individually evaporated and injected in the deposition system.
