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The electron beam system, as a vacuum evaporation source for high rate deposition of pure material and simple deposition of high meltimg point material, is a powerful upgrade of thermal evaporators.
A quartz-based thickness/rate monitor system (STM-100/MF) is implemented in the chamber.
Ultimate pressure Pumpdown time Vacuum chamber Remarks 3x10-7Torr To 3x10-6Torr
25 minutes750F x 800H
(Stainless)Automatic control
Diffusion pump applied
E/B, Layer
Product Application Film material IC/LSI/VLSI Conductor and electrode Ni, Ag, Au-Ge, Ti-Ag-Au, Al, Al-Si, Al-Si-Cu,
Mo, Mo-Si2, W-Si, Ti-Pt-Au, W-Au, Mo-Au, Cr-Cu-AuWafer rearside coating Au, Ni, Ni-Au, Au-Si, Cr-Ni, Cr-Ni-Au, Cr-Cu-Au, Ti-Au Electrode Pb-Sn, Pb-In Hybrid IC Cunductor Cr-Cu, Cr-Au Condensor SiO, SiO2, Al2O3, Ta2O5, TiO2 Resistor Ta, Ta2N, Ta-Al-N, Ta-Si, Cr-SiO, NiCr, SnO2, TiCr Solar cell Electrode Al, Ti-Ag Reflactive protector SiO2, SiO Thermal head Resistor Si-Ta, Ta2Ni, NiCr, Ta-SiO2 Electrode Cr-Cu, NiCr-Au, Al