Growth Systems
Plasma Polymerization System
Main system characteristics
The plasma polymerization deposition system allows the deposition of a wide range of polymer-like functional films which chemical composition depends on the liquid monomer precursors: Acrylic Acid; Ethylenediamine; DiethyleneGlycoleDimethylEther; organosilanes; organosiloxanes; etc.
Available gas lines and vapour/gas delivery
- Ar, N2, O2, CF4
- heated reservoirs (bubblers) for liquid reactants
- shower electrode
Pumping system
- mechanical pump
- ulimate vacuum 10-2 Torr
Plasma generation:
- pulsed plasma
- radio frequency (13.56 MHz) capacitive discharge
- maximum power 300 W
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