Materials and Processes for Micro & Nano Technologies
Growth Systems
High-temperature Magnetron Sputtering Deposition System
The radio frequency - magnetron sputtering system allows the deposition of a wide range of conductive and insulating materials, including Al, AlN, AlO, AlNO, Cr, CrN, Pd.
Available gas linesPumping system:
- Ar, N2, O2, CF4
Plasma generation:
- turbomolecular and mechanical pump in sequence
- ultimate vacuum 10-8 Torr
- radio frequency (13.56 MHz) capacitive discharge
- maximum power 300 W
