Growth Systems
Multi-target Magnetron Sputtering
Our multitarget sputtering machine is used to produce thin film multilayered nanostructures exhibiting tunnel-effect magnetoresistance (TMR) and giant magnetoresistance (GMR).
Available gas lines
Available sputtered materials
- Co, Fe, Ni, Cr, FeNi (Py), CoCr, Cu, Mg, Ta, CaO, NiO
Sputtering sources
- 2 RF magnetron cathodes
- 1 RF cathode for deposition of magnetic materials
- DC brushless motor, operated by a remote control software, used to position the sample holder above the desired sputtering source
Pumping system
- ion pump (100 l/s), turbomolecular (1000 l/s) and mechanical pump (80 m3/h) in sequence
- ultimate vacuum 10-10 Torr
- load-lock chamber to insert and recover substrates with a
horizontal magnetic transfer feedthrough, pumped by mechanical pump (16 m3/h)
Heating unit
- maximum heater temperature 1000 °C
Plasma generation
- radio frequency (13.56 MHz) capacitive discharge
- maximum power 500 W
Other features
- UV assisted oxidation subsystem
- magnetic field thermal annealing subsystem
- DUV silica window for flash laser annealing
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