Laser Pattern Generator

MICROTECH LaserWriter LW405A                                                                              


Direct Laser Exposure access is granted through the strategic partnership with IIT-CSHR.

Applications: mask fabrication, integrated and diffractive optics, micromechanics and MEMS, maskless direct patterning, …


• GaN laser source (405 nm, 60 mW) with direct modulation

• Autofocus, surface tracking (z stage) and gray-level (256 levels per pixel) patterning capability

• XY stages with nanopositioning capability

• Maximum substrate dimensions: 150 x 150 mm

• Optical resolution (minimum linewidth): 0.8, 2, 4, 8 μm, operator selectable