Laser Pattern Generator
MICROTECH LaserWriter LW405A 
Direct Laser Exposure access is granted through the strategic partnership with IIT-CSHR.
Applications: mask fabrication, integrated and diffractive optics, micromechanics and MEMS, maskless direct patterning, …
• GaN laser source (405 nm, 60 mW) with direct modulation
• Autofocus, surface tracking (z stage) and gray-level (256 levels per pixel) patterning capability
• XY stages with nanopositioning capability
• Maximum substrate dimensions: 150 x 150 mm
• Optical resolution (minimum linewidth): 0.8, 2, 4, 8 μm, operator selectable