Two-Photon Polymerization (2PP)
2PP – M4D System
Two-photon polymerization as a direct laser writing technique allows for creating complex three-dimensional structures down to feature sizes on the order of 100 nm. Key elements of two-photon polymerization are lasers providing femtosecond pulses, suitable photosensitive materials (photoresists), a precise positioning stage and a computer to control the procedure.
Optical system:
Laser 773 nm, FWHM 8 nm, 132 fs, 80 MHz, 500 mW
Objective 1 100 x immersion oil, NA 1,4
Objective 2 20 x, NA 0,5
Objective 3 50 x, NA 0,8
Focusing manual
Nanopositioning stages:
Lateral resolution (X, Y) 100 nm or better (objective 1)
Vertical resolution (Z) 500 nm or better (objective 1)
Typical processing speed 0.1 – 10 mm/s
Maximum axis speed (X, Y) 300 mm/s
Maximum axis speed (Z) 2000 mm/s
Laser Scanner Galvano Scanner
Writing area (X, Y) 100 mm x 100 mm
Resolution (X,Y) 4 nm or better
Travel range (Z) 100 mm
Structuring height (Z) 2 mm (objective 2)
Overall accuracy (X, Y, Z) ±200 nm
Repeatability (X, Y) ±50 nm
Repeatability (Z) ±100 nm
Materials: works well with the proprietary Femtobond resin. Other photopolymerizable materials to be tested
The printer works with *.STL geometry files.